Our cryogenic dielectric etch technology—Lam Cryo 3.0—delivers enhanced etch rates, vertical high aspect ratio (HAR) profiles, and more. Learn how Lam Cryo 3.0 is optimized to manufacture next-generation 3D NAND devices with 400 layers and beyond from Group VP and GM of Etch Product Group, Harmeet Singh. https://bit.ly/3yCkBVv | Lam Research Corporation
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Our cryogenic dielectric etch technology—Lam Cryo 3.0—delive…
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Plasma etch: where science meets precision. Using plasma, chipmakers can carve microscopic patterns on a wafer. Learn how our plasma etch systems define the pathways that bring advanced technology to life. https://bit.ly/4mji5qd | Lam Research Corporation
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2.6K views · 54 reactions | Our proprietary etch technology suite — Akara® — supports the production of high-performance, high-density chips. Integrated on Lam’s high-productivity Sense.i® platform, Akara leverages Equipment Intelligence® solutions for automated maintenance to reduce overall equipment upkeep. Learn more. https://bit.ly/4i5iURo | Lam Research Corporation | Facebook
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