The Benefits Of Curvilinear Full-Chip Inverse Lithography Technology With Mask-Wafer Co-Optimization
A technical paper titled “Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer ...
Abstract: This work presents a novel procedure to address the synthesis of metalens antennas with tight requirements in near-field complex scenarios. A model to compute the near field is introduced ...
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